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X-WR-CALNAME:Engineering Seminar: Thin Film Growth by Ion-Assisted Sputteri
 ng – A Case Study of Titanium Diboride
X-WR-TIMEZONE:Central Time (US & Canada)
BEGIN:VEVENT
DTSTAMP:20261013T132257Z
UID:tag:localist.com\,2008:EventInstance_48596379269090
DTSTART:20250207T190000Z
DTEND:20250207T200000Z
DESCRIPTION:Dr. Niklas Hellgren\, Professor of Physics and Chair of the Dep
 artment of Computing\, Mathematics\, and Physics at Messiah University\, w
 ill give a seminar titled "Thin Film Growth by Ion-Assisted Sputtering –
  A Case Study of Titanium Diboride" to the interested faculty and students
  at Discovery Park.\n\n \n\nAbstract\n\nIon bombardment during thin-film g
 rowth has long been recognized as a critical factor for tailoring film pro
 perties. In conventional DC magnetron sputtering (DCMS)\, where the ioniza
 tion fraction is typically limited to a few percent\, the ability to fine-
 tune these properties is relatively constrained. However\, the advent of h
 igh-power impulse magnetron sputtering (HiPIMS) has transformed the landsc
 ape\, enabling ionization rates that can exceed 50%. This is achieved by d
 elivering short\, high-intensity power pulses\, which offer new opportunit
 ies for precise control of film characteristics. At the same time\, the in
 troduction of additional process parameters presents challenges in underst
 anding and optimizing the process space.\n\nIn this talk\, I will explore 
 the influence of growth parameters during DCMS and HiPIMS deposition of ti
 tanium diboride (TiB₂). As a refractory ceramic\, TiB₂ boasts exceptio
 nal properties\, including high hardness\, a high melting point\, and exce
 llent thermal and electrical conductivity. Additionally\, its growth provi
 des an intriguing case study due to the disparity in mass\, size\, and ion
 ization potential of its constituent elements\, making the film compositio
 n particularly sensitive to deposition conditions. While TiB₂ is distinc
 tive in many respects\, the insights from this study extend beyond a singl
 e material\, offering valuable guidance for other material systems and app
 lications\, such as microelectronics and advanced coatings.\n\n \n\nBio\n\
 nDr. Niklas Hellgren is a Professor of Physics and Chair of the Department
  of Computing\, Mathematics\, and Physics at Messiah University in Mechani
 csburg\, Pennsylvania. He earned his Ph.D. in Materials Science from Link
 öping University\, Sweden\, in 1999\, followed by a postdoctoral fellowsh
 ip at the Materials Research Laboratory at the University of Illinois Urba
 na-Champaign. Dr. Hellgren then joined Intel Corporation as a Senior Proce
 ss Development Engineer in the Portland Technology Development division\, 
 where he contributed to cutting-edge advancements in semiconductor technol
 ogy. With three decades of expertise in thin-film growth and characterizat
 ion\, Dr. Hellgren has made significant contributions to the study of bori
 des\, carbides\, nitrides\, and oxides\, utilizing techniques such as magn
 etron sputtering\, HiPIMS\, and plasma-enhanced CVD. He has given numerous
  presentations around the world and has authored over 65 peer-reviewed pub
 lications.
GEO:33.253134;-97.148579
LOCATION:Discovery Park Building\, K150
SUMMARY:Engineering Seminar: Thin Film Growth by Ion-Assisted Sputtering 
 – A Case Study of Titanium Diboride
URL;VALUE=URI:https://calendar.unt.edu/event/es-202502071300
CATEGORIES:Lectures & Speakers
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